Bulg. J. Phys. vol.26 no.1-2 (1999), pp. 065-070
Diffusion Barrier Properties of CVD Thin Tungsten and Tantalum Films Deposited on WC/Co Metalloceramics
K. Gesheva, D. Gogova, T. Ivanova
Central Laboratory for Solar Energy and New Energy Sources, Bulgarian Academy of Sciences, 72 Tzarigradsko Chaussee Blvd., 1784 Sofia, Bulgaria
go backCentral Laboratory for Solar Energy and New Energy Sources, Bulgarian Academy of Sciences, 72 Tzarigradsko Chaussee Blvd., 1784 Sofia, Bulgaria
Abstract. Thin Tungsten (W) and Tantalum (Ta) films were deposited by pyrolysis from W(CO)6, WCl6 and TaCl5 precursors on WC/Co metalloceramics substrates, containing 7–8% and 11–12% Co. Their properties to preventing a Co diffusion from the substrate to the surface coating have been studied by X-ray microprobe enalysis, Auger electron spectroscopy and Direct Layer by Layer Spectral Analyses in Hallow Cathode method.