Bulg. J. Phys. vol.28 no.5-6 (2001), pp. 256-274



Diamond Deposition on Metals from the Vapour Phase: Nucleation, Growth and Adhesion Studies

N. Ali1, Q. Fan1, W. Ahmed2, J. Gracio3
1Centre for Mechanical Technology and Automation, University of Aveiro, 3810-193 Aveiro, Portugal
2Department of Chemistry and Materials, Manchester Metropolitan University, Manchester, UK
3Centre for Mechanical Technology and Automation, University of Aveiro, 3810-193 Aveiro, Portugal
Abstract. Thin polycrystalline films of diamond have been deposited onto various substrates including copper, stainless steel, titanium and chromium using hot filament and microwave plasma enhanced chemical vapour deposition processes. Surface pre-treatments used to enhance diamond nucleation included polishing using a range of abrasives of different sizes, ultrasonic cleaning and negative biasing. Furthermore, a new approach of further increasing the diamond nucleation density has been presented, which amalgamates both substrate polishing and biasing. Biasing produced broad D- and G-bands of microcrystalline graphite, as evident from the Raman spectrum. The material formed after the biasing process consisted of a network of amorphous carbon and microcrystalline graphite phases. The D- and G-bands of micro-crystalline graphite totally diminished from the Raman speetmm once the precursor material was exposed to hydrogen plasma for 10 minutes due to the etching of the graphitic phases.

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