Abstract. The plasma enhanced chemical vapor deposition (PECVD) is a powerful and flexible instrument for depositing thin layers, nanocomposites or nanostructures. In this work ZnO layers were grown by metal-organic PECVD (RF – 13.56 MHz) on glass substrates coated with ZnO seed films. Zn acetylacetonate was used as a precursor and oxygen as oxidant. The influence of the oxygen content in gas mixture on the morphology, optical and electrical properties of the deposited layers was studied. ZnO film properties were investigated by scanning electron microscopy (SEM), UV-VIS optical spectrophotometry and current-voltage (I-V) measurements. The results obtained show that the oxygen content in the deposition atmosphere influences the morphology, the optical properties and the electrical resistivity of the obtained ZnO layers. Nanorods with good alignment, vertically orientated to the surface of glass substrate can be observed in the layers deposited at low content of O₂ in plasma at substrate temperature of 400°C.

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